Short Interest in Tokyo Electron Limited (OTCMKTS:TOELY) Increases By 475.3%

Tokyo Electron Limited (OTCMKTS:TOELYGet Free Report) saw a significant increase in short interest in September. As of September 30th, there was short interest totalling 286,500 shares, an increase of 475.3% from the September 15th total of 49,800 shares. Based on an average trading volume of 363,100 shares, the days-to-cover ratio is currently 0.8 days.

Analysts Set New Price Targets

Separately, Sanford C. Bernstein upgraded Tokyo Electron to a “strong-buy” rating in a research report on Monday.

Check Out Our Latest Report on Tokyo Electron

Tokyo Electron Trading Down 2.0 %

OTCMKTS TOELY traded down $1.74 on Friday, reaching $85.93. 73,057 shares of the company were exchanged, compared to its average volume of 175,790. The business’s fifty day moving average price is $87.38 and its 200 day moving average price is $104.25. The stock has a market capitalization of $79.57 billion, a P/E ratio of 32.06 and a beta of 1.50. Tokyo Electron has a fifty-two week low of $64.30 and a fifty-two week high of $134.91.

Tokyo Electron (OTCMKTS:TOELYGet Free Report) last released its quarterly earnings data on Thursday, August 8th. The company reported $0.87 earnings per share for the quarter. The company had revenue of $3.56 billion for the quarter, compared to analyst estimates of $3.12 billion. Tokyo Electron had a return on equity of 24.79% and a net margin of 21.32%. Equities research analysts forecast that Tokyo Electron will post 3.23 earnings per share for the current year.

Tokyo Electron Company Profile

(Get Free Report)

Tokyo Electron Limited, together with its subsidiaries, develops, manufactures, and sells semiconductor and flat panel display (FPD) production equipment in Japan, Europe, North America, Taiwan, China, South Korea, Southeast Asia, and internationally. The company offers coaters/developers, etch systems, surface preparation systems, deposition systems, test systems, wafer bonders/debonders, wafer edge trimming, SiC epitaxial CVD systems, gas cluster ion beam system, and cleaning systems.

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